On the wafer floor, you know the drill—half a degree of drift in the soft-bake profile and your critical dimension bias is off enough to scrap an entire lot. We built this photoresist baking lamp to take that variable off the table. It puts repeatable heat right where the resist needs it, exactly when it needs it, without adding particle risk or thermal noise. What matters under the hood The system leans on short-wave infrared halogen emitters in a quartz envelope, tuned to the photoresist absorption band so you get rapid, surface-first heating. Across the bake zone, wafer-level uniformity holds at ±0.1°C, so the edge-to-center profile stays stable lot after lot. It’s cleanroom Class 1–100 compatible, thanks to a sealed lamp module, low-outgassing materials, and an exhaust path that keeps particle generation at zero. Repeatability is spec’d at ±0.2°C over 5,000+ hours, with continuous output monitoring so your thermal budget doesn’t drift. Here’s why it plays well in the litho stack: soft bake and hard bake stop being guesswork. You get consistent solvent removal, stable viscosity, and predictable line width—the stuff that directly moves the yield needle. The lamp ramps fast without overshoot, so cycle time drops without chasing temperature swings. Stable bake means fewer scrap and rework lots. Energy use stays tight with on-demand heating and solid thermal coupling, and the module’s reliability keeps you running 24/7 without unplanned downtime. A couple of practical notes. Matching the lamp to your coater/track thermal interface matters. Before integration, verify voltage, connector type, and mounting clearance, and confirm the exhaust routing so you don’t throw off cleanroom pressure differentials. The emitter surface is sensitive to contamination, so stick to scheduled preventive maintenance—otherwise uniformity and temperature accuracy will drift over time.