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		<title>Why on Maximum Warmth Infrared Heaters</title>
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				<title>Why use infrared for wafer processing</title>
				<link>http://ir-heater-warm-max.com/en/posts/why-use-infrared-for-wafer-processing/</link>
				<pubDate>Fri, 26 Jun 2026 01:34:17 +0800</pubDate>
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				<description>&lt;p&gt;&lt;img src=&#34;http://ir-heater-warm-max.com/images/c4487c91a5d0bd93963bf8b3a19ba704.png&#34; alt=&#34;Why use infrared for wafer processing&#34;&gt;&lt;/p&gt;&#xA;&lt;p&gt;On the line, you can watch it happen. A soft bake drifts by 2°C and the photoresist profile shifts—right then. Overlay errors follow, and scrap climbs before the lot even hits etch. That’s why infrared heating isn’t a preference; it’s process control.&lt;/p&gt;&#xA;&lt;h2 id=&#34;infrared-heating-precision-sub-millimeter-uniformity-and-repeatability&#34;&gt;Infrared Heating Precision: Sub-Millimeter Uniformity and Repeatability&lt;/h2&gt;&#xA;&lt;p&gt;Infrared dumps radiant energy straight into the wafer with almost no thermal inertia, so the thermal budget stays tight. You get sub-millimeter uniformity across the substrate and repeatable temperature control lot after lot. In practice, that means soft bake and hard bake profiles stay consistent across the whole wafer, and temperature uniformity keeps &lt;a href=&#34;https://goldisgood.com&#34;&gt;critical&lt;/a&gt; dimensions from wandering. The system repeats the same thermal history &lt;a href=&#34;https://o-yate.com&#34;&gt;every&lt;/a&gt; pass—repeatability that shows up on the spec sheet and on the floor.&lt;/p&gt;</description>
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